1st Step NiP

CMP Corporation - CMP Manufacturing

1st Step NiP

Cabot Microelectronics' next generation 1st step Hard Disk Drive (HDD) slurries are formulated with a unique patented Multi Particle Slurry™ system(s) to deliver ultra high surface finish to meet performance requirements of next generation hard drives.  The table below compares the performance of our products for 1st Step Ni-P.

  

 

 

CMC Lustra DSK5000 1st Step NiP Rigid Disk Data Storage CMP SlurryLustra™ DSK 5000 Series

CMC Lustra F6000 1st Step NiP Rigid Disk Data Storage CMP SlurryLustra™ F6000 Series

CMC Lustra F7000 1st Step NiP Rigid Disk Data Storage CMP SlurryLustra™ F7000 Series

Particles System

Multi-Particles

Multi-Particles

Multi-Particles

Removal Rate

Moderate

Ultra High

High

Defectivity

Low

Low

Lower

Surface Physical Properties

Good

Better

Excellent

Cleanliness

Good

Improved

Improved

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

CMC in Solid State Magazine

Chemical Mechanical Planarization For Metal-gate Integration

CMC's "CMP For Metal-gate Integration" article in Solid State magazine.

For over twenty years of IC manufacturing, the creation of planar device structures has required the use of technologies to reduce topographic variation. Chemical mechanical planarization (CMP) - pressing wafers into rotating pads in the presence of special slurry blends to produce removal through chemically amplified nano-scale abrasion - has become a critical part of modern IC fabrication. Click here to read the full article.