CMP Corporation - CMP Manufacturing

2nd Step Glass Polishing

Cabot Microelectronics' 2nd step glass slurry offerings consist of colloidal silica based formulations to planarize glass substrates.  These formulations meet stringent polish requirements to provide ultra low surface roughness and low defects.  Our glass slurries give excellent cleanability on post polish glass surfaces.

The table below compares the performance of our products for 2nd Step Glass polishing.



CMC Lustra G2000 2nd Step Glass Rigid Disk Data Storage CMP SlurryLustra™ G2000 Series

Particles System

Colloidal Silica-based

Removal Rate


Surface Physical Properties


Semi-SperseTM W2000


Semi Sperse w2000 Tungsten Slurry

Thank You for Choosing Semi-Sperse W2000 Tungsten Slurry

Cabot Microelectronics trusted for over 200 million liters of Semi-Sperse W2000 tungsten slurry provided to the semiconductor industry. We've reached this significant milestone because of our customers' confidence in CMC as the industry leader in tungsten polishing solutions.

>> Learn More about Semi-Sperse W2000