CMP Polishing Pads
Our Epic™ D100 and D200 Series CMP polishing pads are based on proprietary material technology and a state-of-the-art manufacturing process designed to improve pad performance, lower the cost of ownership and provide superior quality. The Polishing Pads consists of a single polymer component and are produced in a continuous single-sheet manufacturing process. The materials and technology behind CMC's CMP polishing pads are extensively patented by Cabot Microelectronics Corporation by an international portfolio of patents.
The unique material properties of the Epic D100 and D200 Series polishing pads result in significantly lower wear rates compared to the industry conventional pads, without any adverse impact on CMP performance or process stability. As a result, Epic D100 and D200 Series pad life is longer than conventional CMP pads available today.
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