CMP Polishing Pads

The Epic^® D100 CMP polishing pad is based on proprietary material technology and a state-of-the-art manufacturing process designed to improve pad performance, lower the cost of ownership and provide superior quality. It consists of a single polymer component and is produced in a continuous single-sheet manufacturing process. The materials and technology behind the Epic D100 CMP polishing pad are extensively patented by Cabot Microelectronics Corporation by an international portfolio of patents.

The unique material properties of the Epic D100 polishing pad result in significantly lower wear rates compared to the industry conventional pads, without any adverse impact on CMP performance or process stability. As a result, Epic D100 pad life is longer than conventional CMP pads available today for both metal and oxide processes.

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