Chemical Mechanical Planarization (CMP) is a polishing process, which utilizes a chemical slurry formulation and mechanical polishing process to remove unwanted conductive or dielectric materials on the silicon wafer, achieving a near-perfect flat and smooth surface upon which layers of integrated circuitry are built.
When you work with Cabot Microelectronics Corporation, you'll discover a trusted partner that delivers chemical mechanical planarization (CMP) innovation that reduces your overall cost of ownership. Cabot Microelectronics offers a variety of CMP Slurry and CMP Polishing Pad solutions to the semiconductor industry.
Industry-leading chemical mechanical planarization research & development and manufacturing facilities in the United States, Japan, Singapore, Taiwan and South Korea allow us to support high-volume CMP manufacturing needs on a global scale. Our nearly 80,000 square meters of infrastructure support the development of advanced CMP slurry and polishing pad technology. Our unequaled and globally based manufacturing infrastructure provides customers with unmatched supply assurance. This, combined with a passionate customer-focused culture, delivers customized products and processes that drive improvements in yield and cost of ownership. >> Watch and learn about our Chemical Mechanical Planarization Solutions
Knowledge. Discover a highly skilled and dedicated workforce that includes a variety of disciplines from technical to business and support staff. Our world-class engineering support, global research and development capabilities are focused on designing and manufacturing performance, quality and consistency into our solutions from the very start.
Experience. Discover our experienced and highly capable global network of employees who have a deep understanding of CMP technology and your business and operational needs. Many of our technical and engineering staff have direct experience working in our customers’ industries.
Innovation. Discover our focused, multidisciplinary team approach to product development of smarter chemical mechanical planarization solutions. Our suite of solutions is the most widely used for successful high-volume manufactured products in the CMP industry. Your process requirements are critical. Why trust something so important to anyone but the industry leader?
Partnership. Discover how our proprietary products are developed through close collaboration with customers. Our philosophy of working closely with customers drives our support operations and fuels our commitment to build and maintain customer partnerships throughout the world.
Cabot Microelectronics Corporation (CMC) is the world’s leading supplier of chemical mechanical planarization (CMP) slurries and a growing CMP pad supplier to the semiconductor industry. Our products are used to level, smooth and remove excess material from the multiple layers deposited upon silicon wafers in the production of semiconductor devices.
Cabot Microelectronics Corporation, announced that it was named as one of only eight companies receiving Intel Corporation's Supplier Continuous Quality Improvement (SCQI) award for its performance in 2012. Cabot Microelectronics Corporation is recognized for its significant contributions in providing Intel with CMP slurries and pads, deemed essential to Intel's success.