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Dielectric/Advanced Dielectric Slurries

We introduced the first slurries for chemical mechanical planarization of inter-layer dielectric (ILD) materials in the early 1980s with systems consisting of high-purity fumed silica abrasives. We remain committed to continuously improving this system, making it extendible to leading-edge devices. At the same time, Cabot Microelectronics continues to develop a portfolio of innovative new products for polishing dielectric layers. With new discoveries such as patented rate control chemistry, selective deceleration additive and tunable slurries, we believe our next-generation products will offer significant benefits to end users. These benefits include improved planarity, reduced defect creation and reduction in cost of ownership.