Data Storage

CMP Chemical Mechanical Planarization

Data Storage CMP Polishing Slurries

Cabot Microelectronics' unique slurry formulations play a critical role in providing a new level of performance and cost benefit to manufacturers of rigid disks and magnetic heads, two critical components of the disk drive.

 

Hard Disk DataStorageRigid Disk CMP Slurries

CMC’s Rigid Disk slurries are specially formulated to planarize Ni-P and glass substrates to an ultra low roughness and defects.  Our Magnetic Head slurries are capable of polishing multi-materials in a single step, with tunable selectivity to meet stringent surface topography planarization requirements. 

Our solutions have enabled rapid industry-wide transition to high-density PMR disk drives and are currently used by leading-edge disk drive customers in high-volume manufacturing.

Click on one of our Rigid Disk CMP Solutions below to learn more.

 

 

 

CMC_DSK5000_for_1st_Step_NiP

1st Step NiP

CMC_F6000_for_1st_Step_NiP

1st Step NiP

CMC_F7000_for_1st_Step_NiP

1st Step NiP

CMC Lustra L9000 2ndStepNiP

2nd Step NiP

CMC_G2000_for_2nd_Step_Glass

2nd Step Glass

 

 

Magnetic Heads CMP Slurries

CMC offers a variety of Magnetic Heads slurries to meet leading edge customers' surface topography planarization and final thickness control requirements. Our products offer multi-material polishing, tunable selectivity and low defects.

 
 

CMC in Solid State Magazine

Chemical Mechanical Planarization For Metal-gate Integration

CMC's "CMP For Metal-gate Integration" article in Solid State magazine.

For over twenty years of IC manufacturing, the creation of planar device structures has required the use of technologies to reduce topographic variation. Chemical mechanical planarization (CMP) - pressing wafers into rotating pads in the presence of special slurry blends to produce removal through chemically amplified nano-scale abrasion - has become a critical part of modern IC fabrication. Click here to read the full article.