Cabot Microelectronics' unique slurry formulations play a critical role in providing a new level of performance and cost benefit to manufacturers of rigid disks and magnetic heads, two critical components of the disk drive.
CMC’s Rigid Disk slurries are specially formulated to planarize Ni-P and glass substrates to an ultra low roughness and defects. Our Magnetic Head slurries are capable of polishing multi-materials in a single step, with tunable selectivity to meet stringent surface topography planarization requirements.
Our solutions have enabled rapid industry-wide transition to high-density PMR disk drives and are currently used by leading-edge disk drive customers in high-volume manufacturing.
CMC offers a variety of Magnetic Heads slurries to meet leading edge customers' surface topography planarization and final thickness control requirements. Our products offer multi-material polishing, tunable selectivity and low defects.
CMC's "CMP For Metal-gate Integration" article in Solid State magazine.
For over twenty years of IC manufacturing, the creation of planar device structures has required the use of technologies to reduce topographic variation. Chemical mechanical planarization (CMP) - pressing wafers into rotating pads in the presence of special slurry blends to produce removal through chemically amplified nano-scale abrasion - has become a critical part of modern IC fabrication. Click here to read the full article.