Chemical Mechanical Polishing CMP Slurry

Tungsten CMP Polishing Slurries

Our tungsten slurries are used and produced worldwide for technology nodes ranging from 0.25 μm to 22 nm and beyond. Our next generation of tungsten slurries, under the brand name WIN™ are “tunable”, which allows the customer greater flexibility, improved performance and a reduced cost of ownership. Our tungsten CMP slurries continue to evolve to meet the needs of a sophisticated global customer base that strives to develop electronic devices with greater performance and smaller size.

Click on one of our Tungsten CMP Solutions below to learn more.


CMC W2000 Tungsten CMP Slurry

 Semi-Sperse W2000 Series


CMC W2585 Tungsten CMP Slurry

Semi-Sperse W2585


CMC W6300 Tungsten CMP Slurry

Semi-Sperse W6300






CMC W7000 Tungsten CMP Slurry

WIN W7000


CMC W7300 Tungsten CMP Slurry

WIN W7300 Series


CMC W7500 Tungsten CMP Slurry

WIN W7500 Series


Semi-SperseTM W2000


Semi Sperse w2000 Tungsten Slurry

Thank You for Choosing Semi-Sperse W2000 Tungsten Slurry

Cabot Microelectronics trusted for over 200 million liters of Semi-Sperse W2000 tungsten slurry provided to the semiconductor industry. We've reached this significant milestone because of our customers' confidence in CMC as the industry leader in tungsten polishing solutions.

>> Learn More about Semi-Sperse W2000