Tungsten CMP Polishing Slurries
Our tungsten slurries are used and produced worldwide for technology nodes ranging from 0.25 μm to 22 nm and beyond. Our next generation of tungsten slurries, under the brand name WIN™ are “tunable”, which allows the customer greater flexibility, improved performance and a reduced cost of ownership. Our tungsten CMP slurries continue to evolve to meet the needs of a sophisticated global customer base that strives to develop electronic devices with greater performance and smaller size.
Click on one of our Tungsten CMP Solutions below to learn more.