Dielectric/Advanced Dielectric CMP Polishing Slurries
We introduced the first slurries for chemical mechanical planarization of inter-layer dielectric (ILD) materials in the early 1980s with systems consisting of high-purity fumed silica abrasives. We remain committed to continuously improving this system, making it extendible to leading-edge devices. At the same time, Cabot Microelectronics continues to develop a portfolio of innovative new products for polishing dielectric layers. With new discoveries such as patented rate control chemistry, selective deceleration additive and tunable slurries, we believe our next-generation products will offer significant benefits to end users. These benefits include improved planarity, reduced defect creation and reduction in cost of ownership.
Featured New Dielectric Slurry
Switch to D9228 and see the positive difference. +
Our new iDIEL D9228 slurry is the next generation colloidal silica-based slurry for bulk oxide applications that utilizes proprietary, ultra-pure colloidal silica particles with precisely engineered surface chemistry. >> Learn More