Tungsten CMP Polishing Slurries
Our tungsten slurries are used and produced worldwide for technology nodes ranging from 0.25 μm to 10 nm and beyond. Our next generation of tungsten slurries, are specially designed for the applications of tungsten gate CMP and advanced tungsten contact CMP. Our tungsten CMP slurries continue to evolve to meet the needs of a sophisticated global customer base that strives to develop electronic devices with greater performance and smaller size.
Featured Tungsten Slurry
Trusted for Over 200 Million Liters
Cabot Microelectronics trusted for over 200 million liters of Semi-Sperse W2000 tungsten slurry provided to the semiconductor industry. We’ve reached this significant milestone because of our customers’ confidence in CMC as the industry leader in tungsten polishing solutions. >> Learn More