Epic^® D100 CMP Polishing Pad

Product Summary

The Epic D100 is a CMP polishing pad for virtually all applications and technology nodes. The D100 polishing pad is based on proprietary material technology and a state-of-the-art continuous manufacturing process designed to improve pad performance, lower the cost of ownership and provide superior quality. Customers in high-volume manufacturing have validated better polishing performance, especially lower scratch defectivity, than conventional pads for multiple applications.

Epic D100 is a fully commercial product and available to all customers globally. Ample capacity is available with all three manufacturing plants to meet growing demand of this product.

Improved Performance, Tool Uptime and Potentially Higher Yield

• Lower defectivity than conventional polishing pads.
• Nearly equivalent removal rates (with some process tweaks), excellent uniformity and erosion performance.

Lower Cost of Ownership

• Longer pad life (1.3X to 2.5X vs. conventional pads).
• Competitive pricing.

Superior Quality

• Consistency through continuous manufacturing process.
• Quality checkpoints in place for every raw material, as well for each step of the process.
• Developed, manufactured and tested using Six Sigma methodology.
• Leak-free windows (100% tested).
• Each polishing pad is tested on line for all grooves (depth, pitch and width).

Ease of Adoption and Extendibility

• Available in various configurations, including ISRM and RTPC windows, designs and sizes (10" to 32").
• Applications support provided globally for qualification and performance optimization.
• Post-polish analysis support available to all customers globally.