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iDIEL® D6720 Slurry

Product Summary

iDIEL D6720 is Cabot Microelectronics' first-generation ceria platform for oxide polishing. It is formulated with uniquely designed ceria particles to offer extremely low defectivity. This platform also provides efficient slurry usage and high SiN selectivity. It is designed to meet the needs of 130nm to 32nm users.

Reduced Slurry Cost

  • Higher removal rates and low induction time results in over 30% reduction in polishing times on patterned wafers as compared to SS25.
  • Lower slurry consumption as compared to SS25.

Improvement in Product Yield

  • Ultra-low defectivity – 3X reduction in defectivity as compared to SS25.
  • Significant yield improvements validated by customers.

Multi-Purpose Applications

  • Compatible with CMC's proprietary self-stopping additives for DSTI applications.
  • High oxide to SiN selectivity (ideal for selective PMD).