iDIEL D7200 Series

CMP Corporation - CMP Manufacturing

iDIELâ„¢ D7200 Series Slurries

CMC D7200 Bulk Oxide iDiel Dielectric CMP Slurry

Product Summary

iDIEL D7200 Series is Cabot Microelectronics' new ultra low defect offering for bulk oxide polishing. It's a high-purity concentrated slurry, made with engineered ceria particles, formulated for improved defectivity, high-removal rate, excellent uniformity and reduction in slurry cost.




Features & Benefits

Improvement in Product Yield

  • >50% reduction in scratch defectivity as compared to fumed silica.
  • Specially formulated to achieve lower defectivity at lower downforce, resulting in better product yield.

Lower Cost of Ownership

  • Equivalent or higher removal rate (at lower downforce) than fumed silica products.
  • Formulated at a 5-10X concentrated slurry to reduce shipping and handling cost and to achieve lower point-of-use cost.













CMC in Solid State Magazine

Chemical Mechanical Planarization For Metal-gate Integration

CMC's "CMP For Metal-gate Integration" article in Solid State magazine.

For over twenty years of IC manufacturing, the creation of planar device structures has required the use of technologies to reduce topographic variation. Chemical mechanical planarization (CMP) - pressing wafers into rotating pads in the presence of special slurry blends to produce removal through chemically amplified nano-scale abrasion - has become a critical part of modern IC fabrication. Click here to read the full article.

iDIELâ„¢ D7200 Series

iDIEL D7200 Series is Cabot Microelectronics' new offering for bulk oxide polishing.

  • Ultra Low Defectivity
  • High Removal Rate
  • Excellent Uniformity
  • High Purity Engineered Ceria Particles
  • Shear Tolerant

 Learn more about the iDIEL D7200 Series