The WIN W7500 Series is Cabot Microelectronics' new low-cost offering for tungsten bulk polishing. The WIN W7500 platform includes precipitated colloidal silica particle to provide excellent planarization performance, low defectivity and tunability at a significantly competitive cost of ownership than current leading-edge products.
CMC's "CMP For Metal-gate Integration" article in Solid State magazine.
For over twenty years of IC manufacturing, the creation of planar device structures has required the use of technologies to reduce topographic variation. Chemical mechanical planarization (CMP) - pressing wafers into rotating pads in the presence of special slurry blends to produce removal through chemically amplified nano-scale abrasion - has become a critical part of modern IC fabrication. Click here to read the full article.