Best Practices

CMC Studies & Best Practices

As a proud partner to the semiconductor industry, Cabot Microelectronics is pleased to provide you with educational tools to help you optimize chemical mechanical planarization (CMP) process reliability and performance.

CMC’s technical staff has the knowledge and experience to help our customers solve complex issues related to the proper methods of mixing and handling cmp slurries.  We would like to be your trusted partner, so please contact us if you have a technical issue that you are unable to resolve.

M&H Challenges:  Next-Generation CMP Slurries


MandH_Challenges_Header_v2  Mixing and Handling Challenges of Next-Generation CMP Slurries

Our newest technical paper highlights mixing and handling challenges of Next-Generation CMP Slurries. With each new generation of semiconductor polishing requiring ever more stringent performance with lower defect tolerance, it is critical to ensure slurry is handled properly to realize the full benefits of its designed-in performance and provide a stable, repeatable slurry to the polisher.

 

Settling Studies


  • Settling Studies
    Learn More

Mechanical Agitation


View Infographics

Mechanical Agitation Impellers

  • Mixing CMP Slurry
    Learn More
  • Dip Tubes & Dispense Heads
    Learn More
  • Drum Configuration
    Learn More
  • Pump Recirculation Demo
    Learn More

Foaming Slurries


View Infographics

Foaming Slurries

  • Foaming Slurries
    Learn More