CMC Studies & Best Practices
As a proud partner to the semiconductor industry, Cabot Microelectronics is pleased to provide you with educational tools to help you optimize chemical mechanical planarization (CMP) process reliability and performance.
CMC’s technical staff has the knowledge and experience to help our customers solve complex issues related to the proper methods of mixing and handling cmp slurries. We would like to be your trusted partner, so please contact us if you have a technical issue that you are unable to resolve.
M&H Challenges: Next-Generation CMP Slurries
Mixing and Handling Challenges of Next-Generation CMP Slurries
Our newest technical paper highlights mixing and handling challenges of Next-Generation CMP Slurries. With each new generation of semiconductor polishing requiring ever more stringent performance with lower defect tolerance, it is critical to ensure slurry is handled properly to realize the full benefits of its designed-in performance and provide a stable, repeatable slurry to the polisher.
