CMP Slurries

CMP Slurries

As a pioneer in chemical mechanical planarization (CMP) slurries, Cabot Microelectronics commercialized our original Semi-Sperse™ products in the 1980s for 250nm cmp applications. With continuous improvement of some of these slurries, enhanced versions are still in use and key to our customer solutions today, such as our flagship Semi-Sperse W2000 product for tungsten CMP.

Over the years, we have successfully introduced a number of new CMP slurry platforms to meet our customers’ evolving CMP needs, while reducing overall cost of ownership. For example, our portfolio of iDIEL™ dielectrics slurries utilizes engineered particles and unique chemistries to achieve improved planarity while significantly reducing defectivity.

Our next-generation tungsten slurries, with the WIN™ brand name, are designed to enable significant planarization improvements for 65nm applications and beyond.  Our next-generation EPOCH™ line of copper slurries provides maximum flexibility to meet specific customer integration requirements.  Additionally, our new line of Sentinel™ slurries for barrier applications is low-k compatible and designed to meet broad technical requirements.  Serving the data storage industry, our Lustra™ and Transele™ product lines improve the surface finish and planarity of certain hard disk drive components.